GW‑Scale High‑Efficiency Solar Cell Turn‑Key Lines

self-developed

Own design, with independent intellectual property rights of high-end solar energy production equipment
99.8%

The finished product yield is high
Turn-Key

HDT high efficiency heterojunction solar cell line equipment engineering
整线装备输出

Rapid delivery

GW‑Scale Per‑Line Solar Cell Production Equipment

The company has independently developed core equipment such as PECVD and PVD, boasting a comprehensive intellectual property portfolio.
The company holds proprietary intellectual property rights for core production equipment including PECVD and PVD. Major equipment such as PECVD, PVD and printers supports 182 mm and 210 mm silicon wafers, catering to future‑oriented industry requirements.
The company’s heterojunction cell production lines have passed verification and upgrades from 100 MW‑scale to 500 MW‑scale mass production, and 1 GW‑per‑line heterojunction mass‑production lines have been rolled out.
In 2025, the company took the lead in launching HBC‑PECVD equipment dedicated to Hybrid‑BC (HBC) cell manufacturing.
The company’s GW‑scale per‑line solar cell production equipment has been deployed for multiple leading enterprises in the industry.

Built upon GoldstoneSolar’s 7th‑generation technology, the core PECVD equipment is precision‑manufactured in Japan.
It addresses a common pain point of existing heterojunction production‑line solutions: excessive process chambers deployed for throughput targets, which leads to poor equipment uptime.
The proprietary I‑IN‑P architecture eliminates gas cross‑contamination between chambers. Notably, carriers for the P‑layer operate independently without cross‑usage, greatly enhancing process stability.
Equipped with 13.56 MHz RF plasma glow‑discharge technology, the equipment is well‑suited for mass production of microcrystalline cells.

The company’s HBC (Hybrid BC) cell production‑line process features high‑temperature processes in the front‑end and low‑temperature processes in the back‑end, achieving seamless integration of TOPCon and HJT technologies.
With streamlined processes, it is highly suitable for large‑scale mass production.
Boasting a simple structure with fewer chambers, it only requires one‑third of the chambers needed for HJT‑PECVD, helping customers cut costs.
The overall equipment length is greatly reduced, resulting in a significant decrease in floor‑space occupation.

Modular in‑line system designed exclusively for solar applications
Proprietary 13 × 26 carrier size and system design with independent intellectual property rights
Adopting a large‑chamber design, the equipment delivers a considerably effective coating area per chamber for easier high‑throughput realization
Excellent scalability to accommodate silicon wafers of 182 mm, 210 mm and other sizes
Fully‑automatic high‑efficiency wafer loading and unloading among functional modules
Split hollow‑out carrier design reduces heating energy consumption. It can be adjusted according to process requirements or wafer dimensions. CCD positioning for each individual wafer makes it well‑suited for wafer thinning.
Proven stable equipment with low failure rate and high equipment utilization rate

Proven and reliable equipment with low failure rate and high equipment utilization
Up‑and‑down rotary target design enables simultaneous double‑side coating
Cold traps are fully equipped for isolation chambers, buffer chambers and process chambers to effectively adsorb water‑vapor molecules inside chambers. The adjustable cold‑trap temperature allows precise control of water‑vapor partial pressure within process chambers.
Heaters are installed inside high‑vacuum chambers, buffer chambers and process chambers for flexible adjustment of deposition temperature. When restarting after chamber opening, heaters accelerate desorption of gas molecules from solid surfaces, speeding up pumping‑down and equipment recovery time.
Process chambers are fitted with an RGA monitoring system for real‑time tracking of water‑vapor partial pressure.

Modular design enables continuous in‑line coating and continuous production, facilitating intelligent manufacturing upgrade.
With the I+IN+P configuration, carriers for each equipment segment operate independently without cross‑contamination for high process stability.
Valves are installed between chambers for isolation, resulting in low gas consumption and zero gas crosstalk, delivering superior process flexibility.
Short production line and streamlined processes make it well‑suited for high‑throughput mass production.

Currently, most commercially‑available chambers exceed 2 meters, longer than the quarter‑wavelength of VHF. For HBC processes where PECVD is mainly used for amorphous‑layer deposition, the 13.56 MHz RF power supply is better suited for large‑chamber PECVD coating.
The RF feed‑in assembly is upgraded from four feed‑in points to five. It is well matched with high‑power supplies to optimize electric‑field distribution and deliver improved coating uniformity.
RF power can be independently allocated per process requirement to realize multiple combined power output modes, achieving more consistent electric‑field distribution inside the chamber.

Possesses proven mass‑production experience with stable, mature GW‑scale‑per‑line solar cell production lines.
The turnkey solution is customer‑oriented, providing equipment or complete production lines best‑suited for client requirements.
Capable of fast delivery, enabling rapid delivery of standardized production‑line planning, turnkey equipment and line‑integration services.
Sufficient pool of technical personnel to guarantee fast‑track installation, commissioning and mass‑production ramp‑up for customers.